Electron-beam lithography system

The electron-beam lithography system turns off and on an electron beam using a blanking device and deflects to a prescribed position by deflection coils. Combining movements of the electron beam and the stage to directly expose a resist on a substrate surface, fine patterns of less than several hundred nm can be created.


How to adjust the electron beam

[ 00:17:45 ]


How to set CAD data and conditions for exposure

[ 00:19:04 ]


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