Maskless Lithography system
The Maskless Lithography system allows for the exposure of any micro-pattern data created by CAD directly onto the substrate.
Usually the system is used for photolithography processing, a fine processing technology whereby a substrate coated with photosensitive material is irradiated by a light source.
This system does not require a plate called photomask which is employed in general photolithography process to determine the pattern of light, consequently, a large quantities of fine structures can be created in a short amount of time.
This lecture provides an explanation of operation steps of a basic exposure process.